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EUV Photoresist Sensitivity Calibrations

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http://www.cxro.msd.lbl.gov/system/files/highlight_images/dose-calibration.pngAbsolute resist calibration measurements done using the CXRO Calibrations and Standards Beamline and the CXRO EUV Microfield Exposure Tool have revealed that EUV resist are twice as fast as previously thought. These results apply to essentially all EUV photoresist and all EUV tools in the world.


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